Tokyo Electron 3D80-000710-V3冷卻機(jī)組件 PDF資料
1.產(chǎn) 品 資 料 介 紹：
中文資料：
Tokyo Electron 3D80-000710-V3 冷卻機(jī)組件 是用于半導(dǎo)體制造設(shè)備中的關(guān)鍵熱管理單元，其主要功能是對設(shè)備內(nèi)部產(chǎn)生的熱量進(jìn)行有效控制和散熱，保障系統(tǒng)在高精度、高負(fù)載運(yùn)行下的穩(wěn)定性和性能。以下是其產(chǎn)品應(yīng)用領(lǐng)域的詳細(xì)分析：
一、主要應(yīng)用領(lǐng)域
半導(dǎo)體蝕刻設(shè)備（Etching Systems）
冷卻機(jī)組件用于控制反應(yīng)腔溫度，防止等離子體處理過程中產(chǎn)生過熱現(xiàn)象。
確保工藝氣體反應(yīng)的溫控精度，提高蝕刻圖形一致性。
化學(xué)氣相沉積系統(tǒng)（CVD, PECVD, SACVD 等）
在薄膜沉積過程中冷卻反應(yīng)腔體、基板傳送系統(tǒng)、真空泵等關(guān)鍵子系統(tǒng)。
控制熱負(fù)荷以提升膜厚均勻性與成膜質(zhì)量。
光刻設(shè)備（Lithography Equipment）
用于冷卻曝光系統(tǒng)的光源模塊或曝光臺底板，保障曝光精度。
在高重復(fù)頻率操作中維持系統(tǒng)熱穩(wěn)定性，降低熱漂移誤差。
晶圓傳送與對準(zhǔn)模塊（Wafer Transfer & Alignment Systems）
對馬達(dá)驅(qū)動部件或傳送機(jī)械臂提供冷卻，延長設(shè)備使用壽命。
保持恒溫狀態(tài)，提高晶圓對準(zhǔn)精度與機(jī)械響應(yīng)速度。
真空泵及冷卻循環(huán)系統(tǒng)
與工藝泵系統(tǒng)耦合，作為制程運(yùn)行中輔助熱管理單元。
控制真空腔體內(nèi)的溫度，提升抽氣系統(tǒng)效率。
英文資料：
The Tokyo Electron 3D80-000710-V3 cooling unit is a critical thermal management unit used in semiconductor manufacturing equipment. Its main function is to effectively control and dissipate the heat generated inside the equipment, ensuring the stability and performance of the system under high-precision and high load operation. The following is a detailed analysis of its product application areas:
1、 Main application areas
Semiconductor Etching Systems
The cooling machine component is used to control the temperature of the reaction chamber and prevent overheating during plasma processing.
Ensure the temperature control accuracy of process gas reaction and improve the consistency of etching patterns.
Chemical vapor deposition systems (CVD, PECVD, SACVD, etc.)
During the thin film deposition process, key subsystems such as the cooling reaction chamber, substrate transfer system, and vacuum pump are cooled.
Control heat load to improve film thickness uniformity and film quality.
Lithography Equipment
Used to cool the light source module or exposure stage substrate of the exposure system, ensuring exposure accuracy.
Maintain system thermal stability and reduce thermal drift errors during high repetition rate operations.
Wafer Transfer&Alignment Systems
Provide cooling for motor driven components or conveying robotic arms to extend equipment lifespan.
Maintain a constant temperature to improve wafer alignment accuracy and mechanical response speed.
Vacuum pump and cooling circulation system
Coupled with the process pump system, serving as an auxiliary thermal management unit during process operation.
Control the temperature inside the vacuum chamber to improve the efficiency of the pumping system.
2.產(chǎn) 品 展 示
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